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AMOLF
hosts the Amsterdam nanoCenter, a facility for nanofabrication and nanocharacterization.
It provides the following instruments:
- Cleanroom
- electron beam pattern generator (EBPG)
- mask aligner for optical lithography
- plasma etching system
- chemical bench for organic processes, including spin coater and baking system
- chemical bench for inorganic etch processes
- surface profilometer
- inspection microscope
- Optical tweezers
- High-resolution scanning
electron microscope with EDX, EBSP and cathodoluminesence imaging
spectroscopy
- Rutherford backscattering
spectrometry
- Spectroscopic ellipsometer
- Atomic force microscope
- Thin-film evaporation
tools
- Rapid thermal annealing furnace
- Tube furnace
In addition, the Photonic
materials group maintains a laboratory for nanophotonic characterization
- Near-field scanning optical microscope
/ confocal microscope / AFM combination (visible, infrared)
- Confocal imaging photoluminescence
microscopy, with lifetime imaging (visible, infrared)
- Ar laser, tunable
Ti:sapphire laser, tunable 1.5 micron laser, high power 1480 nm pump lasers,
frequency-doubled-YAG laser, semiconductor lasers, broadband light sources
- Ge detectors, visible
and IR PMTs
- Cryostat (12-400 K)
- Photon counting
techniques
- Piezo-electric
waveguide coupling set-up
last updated:
12-11-06 |
